Many experiments are nowadays conducting worldwide on superconducting films based on the recently developed high Tc superconductor materials (YBCO, BISCO, etc). There are different ways to produce these films, among which sputtering and evaporation are most popular. Normally, use is made of oxides, pure metals or compounds as material sources. In the present paper we describe the fabrication process and the physico‐chemical characteristics of various metallic alloy components for both sputtering and evaporation processes which show various advantages in terms of stability, easiness of use, purity, flexibility in composition and shape and allow good process control. Deposition techniques and experimental results obtained on thin films of the new superconductors realized starting from these alloys are also reported.
Metallic alloy targets for high Tc superconducting film deposition
Romano P;
1989-01-01
Abstract
Many experiments are nowadays conducting worldwide on superconducting films based on the recently developed high Tc superconductor materials (YBCO, BISCO, etc). There are different ways to produce these films, among which sputtering and evaporation are most popular. Normally, use is made of oxides, pure metals or compounds as material sources. In the present paper we describe the fabrication process and the physico‐chemical characteristics of various metallic alloy components for both sputtering and evaporation processes which show various advantages in terms of stability, easiness of use, purity, flexibility in composition and shape and allow good process control. Deposition techniques and experimental results obtained on thin films of the new superconductors realized starting from these alloys are also reported.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
