A microstructured fibre Bragg grating that relies on a partial and localised etching of the cladding layer along the grating region is proposed. The main effect is the formation of defect states inside the bandgap depending on surrounding refractive index. This leads to the possibility of realising novel optoelectronic devices for sensing and telecommunication applications.

A microstructured fibre Bragg grating that relies on a partial and localised etching of the cladding layer along the grating region is proposed. The main effect is the formation of defect states inside the bandgap depending on surrounding refractive index. This leads to the possibility of realising novel optoelectronic devices for sensing and telecommunication applications.

Microstructured fibre Bragg gratings: analysis and fabrication

Iadicicco A;Campopiano S;Cutolo A;Cusano A
2005

Abstract

A microstructured fibre Bragg grating that relies on a partial and localised etching of the cladding layer along the grating region is proposed. The main effect is the formation of defect states inside the bandgap depending on surrounding refractive index. This leads to the possibility of realising novel optoelectronic devices for sensing and telecommunication applications.
A microstructured fibre Bragg grating that relies on a partial and localised etching of the cladding layer along the grating region is proposed. The main effect is the formation of defect states inside the bandgap depending on surrounding refractive index. This leads to the possibility of realising novel optoelectronic devices for sensing and telecommunication applications.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/20.500.12070/2974
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